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ZhengZhou JiuDe Advanced Materials Technology Development Co., Ltd.

Products >> Abrasive Powder of Semiconductor Monocrystal Silicon Wafer(CA)

Abrasive Powder of Semiconductor Monocrystal Silicon Wafer(CA)

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Description
Product Name: Abrasive Powder of Semiconductor Monocrystal Silicon Wafer(CA)
Supply Ability: 1000000KG
Related proudcts wafer lapping powder, pwa,
Specifications 20KG/BOX
Price Term: FOB
Port of loading: Shanghai
Minimum Order 100KG
Unit Price: 40.00 CNY/KG

CA (Flat Calcined Aluminum Oxide Lapping Powder) applies special production technology, which enables CA to have a equal particle size. CA's crystal shape is platelet, different from equivalent shape or ball shop of traditional abrasives. With this platelet shape CA particles move parallel to the workpiece surface during the grinding or polishing course, thus gliding lapping effect was created, different from rolling lapping effect of traditional abrasives. So the particles will not scratch the workpiece surface. At the same time, because the lapping press distributes equally on the surface of the platelet particles, the number of crashed particles will be less, particles' endurance of lapping will be increased greatly, and so can provide best grinding & polishing effect and surface glaze. Experiments prove that CA abrasives will lessen down grinding and lapping times at least 10-20%, and can achieve fast grinding and polishing. When customers use CA, the amount just need to be 50% or more as much as traditional abrasives.

Usage: CA is used for lapping high-grade optical glass, silicon semiconductor wafer, crystal, piezoelectricity quartz crystal, stainless steel, etc.

Code Particle Size(¦Ìm)
CA15 10.5¡À1.0
CA12 8.0¡À0.8
CA9 6.2¡À0.5

Contact Us
Company: ZhengZhou JiuDe Advanced Materials Technology Development Co., Ltd.
Contact: Mr. Jianpeng Cheng
Address: 0910 Room, D Block, Qihang Tower, Hanghai East Road, Zhengzhou, Henan, China.
Postcode: 450009
Tel: 86 371 65316722
Fax: 86 371 65316722
E-mail:         


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